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Título del libro: Program And Abstract Book - 2010 7th International Conference On Electrical Engineering, Computing Science And Automatic Control, Cce 2010
Título del capítulo: Structural, photoluminescence and electrical properties of MW-CBD CdZnS thin films

Autores UNAM:
VELUMANI SUBRAMANIAM; JESUS ANGEL ARENAS ALATORRE; JOSE ALVARO CHAVEZ CARVAYAR;
Autores externos:

Idioma:
Inglés
Año de publicación:
2010
Palabras clave:

Ammonium sulphate; Band gaps; Cadmium sulphate; CdZnS; Chemical-bath deposition; Deposited films; Dislocation densities; Electrical property; Grain size; Hexagonal structures; High-resolution scanning electron microscopies; Microwave assisted; Ohmic conduction; PL; SCLC; SIMPLE method; Size and shape; Space charge limited conduction; Zinc sulphate; Zinc sulphide; Ammonium compounds; Automation; Cadmium; Control; Electric properties; Electrical engineering; High resolution electron microscopy; Microwave irradiation; Optoelectronic devices; Photoluminescence; Process control; Scanning electron microscopy; Secondary ion mass spectrometry; Thin films; Thioureas; Urea; Vapor deposition; X ray diffraction; Zinc; Zinc sulfide; Deposition


Resumen:

Thin films of CdZnS have found extensive applications in various optical, electrical and optoelectronic devices. A simple method of microwave assisted chemical bath deposition (MW-CBD) has been used to deposit CdZnS (admium Zinc Sulphide) thin films. The bath solution is composed of Cadmium Sulphate, Zinc Sulphate, thiourea, ammonium Sulphate and ammonia. The concentration of bath solution is varied as Y=0.1, 0.3 and 0.5 where Y=[ZnSO4]/ {[CdSO4] + [ZnSO4]}. Deposition has been carried out for 120s microwave irradiation time. X-ray diffraction (XRD) indicates the hexagonal structure (002) reflection for the as-deposited CdZnS thin films. Grain size, dislocation density and strain in the deposited films have been determined. High resolution scanning electron microscopy (HRSEM) image gives the morphology, size and shape of particles in the deposited CdZnS thin films. Secondary ion mass spectrometry (SIMS) results show that composition is uniform throughout the entire film thickness. Band gap of deposited films as determined by photoluminescence (PL) studies is found to increase from 2.40 eV to 2.47eV with the increase in Y from 0.1 to 0.5. Ohmic conduction and space charge limited conduction (SCLC) has been observed in the deposited films. © 2010 IEEE.


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