| 1 | Deposition of metal thin films using a hollow cathode hydrogen discharge | 2ᵒ autor: Cruz J., Muhl S., Camps I., Garzon-Fontecha A. | 2022 | SURFACE & COATINGS TECHNOLOGY | WoS-id: 000822950800006
Scopus-id: 2-s2.0-85128961406
| 0 | 0 |
| 2 | Si sputtering yield amplification: a study of the collisions cascade and species in the sputtering plasma | 1ᵉʳ autor: Cruz, J., Sangines, R., Soto-Valle, G., Muhl, S., et al. | 2021 | JOURNAL OF PHYSICS D-APPLIED PHYSICS | WoS-id: 000668708800001
Scopus-id: 2-s2.0-85110325918
| 0 | 0 |
| 3 | Study of C, Al, Si and Ge sputtering yield amplification by ion beam analysis and co-sputtering simulation software | 1ᵉʳ autor: Cruz, J., Muhl, S., Andrade, E., de Lucio, O. G. | 2019 | JOURNAL OF PHYSICS D-APPLIED PHYSICS | WoS-id: 000478781600002
Scopus-id: 2-s2.0-85071479906
| 1 | 1 |
| 4 | Modeling the thickness distribution of silicon oxide thin films grown by reactive magnetron sputtering | 1ᵉʳ autor: Cruz, J., Sangines, R., Abundiz-Cisneros, N., Aguila-Munoz, J., et al. | 2019 | JOURNAL OF PHYSICS D-APPLIED PHYSICS | WoS-id: 000487724700001
Scopus-id: 2-s2.0-85073245538
| 2 | 2 |