1 | Plasma emission spectroscopy and optical properties of reactive-sputtered silicon oxynitride films | 2ᵒ autor: Abundiz-Cisneros, N, Rodríguez-López, R, Sanginés, R, Aguila-Muñoz, J, et al. | 2024 | JOURNAL OF PHYSICS D-APPLIED PHYSICS | WoS-id: 001204904600001 Scopus-id: 2-s2.0-85190827848
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2 | Analysis of pulsed direct current reactive magnetron sputtering on a silicon target | Coautor: Abundiz-Cisneros, N, Teran-Hinojosa, E, Sanginés, R, Aguila-Muñoz, J, et al. | 2024 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | WoS-id: 001321277100004 Scopus-id: 2-s2.0-85205923433
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3 | Role of different atmosphere gasses during annealing in chemical-solution-deposition NiO thin films processing | Coautor: Abundiz-Cisneros, N., Martinez-Gil, M., Cabrera-German, D., Rodriguez-Curiel, M., et al. | 2023 | JOURNAL OF NON-CRYSTALLINE SOLIDS | WoS-id: 000906918800001 Scopus-id: 2-s2.0-85141482052
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4 | Linear and nonlinear properties study of silicon nitride films for integrated photonics | Coautor: Abundiz-Cisneros, N., Aguayo-Alvarado, A. L., Araiza-Sixtos, F. A., Rangel-Rojo, R., et al. | 2023 | JOURNAL OF NON-CRYSTALLINE SOLIDS | WoS-id: 001009032000001 Scopus-id: 2-s2.0-85158867101
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5 | Study of deposition parameters of reactive-sputtered Si3N4 thin films by optical emission spectroscopy | Coautor: Abundiz-Cisneros N., Rodríguez-López R., Soto-Valle G., Sanginés R., et al. | 2022 | Thin Solid Films | WoS-id: 000814390000003 Scopus-id: 2-s2.0-85130830520
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6 | Optimization of SrRuO3bottom electrodes fabricated by RF magnetron ion sputtering for new generation devices | Coautor: Abundiz Cisneros N., Sharma S., Vazquez Valerdi D.E., Campos Mendoza R., et al. | 2021 | INTERNATIONAL CONFERENCES & EXHIBITION ON NANOTECHNOLOGIES, ORGANIC ELECTRONICS & NANOMEDICINE, NANOTEXNOLOGY 2020, PT 1 | Scopus-id: 2-s2.0-85116434982
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7 | Non-quarter-wave dielectric mirror prepared by thermal atomic layer deposition | Coautor: Abundiz N., Lopez J., Márquez H., Borbón - Nuñez H., et al. | 2020 | OPTICS AND LASER TECHNOLOGY | WoS-id: 000523646800036 Scopus-id: 2-s2.0-85080037566
| 1 | 2 |
8 | Modeling the thickness distribution of silicon oxide thin films grown by reactive magnetron sputtering | Coautor: Abundiz-Cisneros, N., Cruz, J., Sangines, R., Aguila-Munoz, J., et al. | 2019 | JOURNAL OF PHYSICS D-APPLIED PHYSICS | WoS-id: 000487724700001 Scopus-id: 2-s2.0-85073245538
| 3 | 3 |