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Título del libro: 2017 Photonics North, Pn 2017
Título del capítulo: Ultrafast third-order nonlinear ultraviolet response exhibited by ion-implanted silicon nanoparticles in silica

Autores UNAM:
CARLOS TORRES TORRES; JHOVANI ENRIQUE BORNACELLI CAMARGO; JUAN CARLOS CHEANG WONG; LUIS RODRIGUEZ FERNANDEZ; ALICIA MARIA OLIVER Y GUTIERREZ;
Autores externos:

Idioma:
Inglés
Año de publicación:
2017
Palabras clave:

Nanoparticles; Neodymium lasers; Nonlinear optics; Pinch effect; Silica; Silicon implants; Ion-implanted silicon; Physical mechanism; Saturated absorptions; Silicon nanoparticles; Two-level models; Ultraviolet absorption; Ultraviolet response; Ultraviolet transmittances; Ion implantation


Resumen:

Described herein is the evaluation of the nonlinear ultraviolet transmittance exhibited by Silicon nanoparticles nucleated in a high-purity silica matrix. A saturated absorption was identified as the main physical mechanism responsible for the nonlinear ultraviolet absorption in a nanosecond regime. A single-beam transmittance experiment was carried out with pulses provided by the third harmonic of a Nd:YAG laser system. A two-level model led us to estimate the ultrafast optical response of the nanoparticles. It is highlighted the potential of the sample to control nanophotonic signals. © 2017 IEEE.


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